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Search for "on-/off-current ratio" in Full Text gives 7 result(s) in Beilstein Journal of Nanotechnology.

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

  • Liga Jasulaneca,
  • Jelena Kosmaca,
  • Raimonds Meija,
  • Jana Andzane and
  • Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

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  • the contact electrode [49]. A jump-in voltage lower than 1 V and on/off current ratio higher than 105 were demonstrated for this 2T NEM switch, employing an innovative “pipe-clip” architecture. However, the device showed poor reliability with marked deterioration in performance after 10–20 switching
  • of electrical contacts. CNT-based NEM switches exhibit a high on/off current ratio (104–105) [59] and switching speed (≈1 ns) [37] in combination with a jump-in voltage that can be as low as a few volts [35][37]. Yet, most of these devices were unique laboratory scale demonstrations. To the best of
  • the on/off current ratio by an order of magnitude [9], but coating of a Si-based NEM switch with amorphous carbon (aC) (Figure 11b) [61] allowed more than 108 switching cycles to be achieved. An alternative method of lowering the on-state voltage range is removing the native oxide layer from the
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Published 25 Jan 2018

Impact of contact resistance on the electrical properties of MoS2 transistors at practical operating temperatures

  • Filippo Giannazzo,
  • Gabriele Fisichella,
  • Aurora Piazza,
  • Salvatore Di Franco,
  • Giuseppe Greco,
  • Simonpietro Agnello and
  • Fabrizio Roccaforte

Beilstein J. Nanotechnol. 2017, 8, 254–263, doi:10.3762/bjnano.8.28

Graphical Abstract
  • . These properties make MoS2 an interesting material for the next generation of electronics and optoelectronics devices [2]. As an example, field effect transistors with very interesting performance in terms of the on/off current ratio (106–108) and low subthreshold swing (≈70 meV/decade) have been
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Published 25 Jan 2017

High Ion/Ioff current ratio graphene field effect transistor: the role of line defect

  • Mohammad Hadi Tajarrod and
  • Hassan Rasooli Saghai

Beilstein J. Nanotechnol. 2015, 6, 2062–2068, doi:10.3762/bjnano.6.210

Graphical Abstract
  • ). Because of the reduction of the tunneling current, the off-current in ELD-GNRFET transistors decreases by factor of ca. 2.5 compared to GNRFET transistors. Overall, the on/off current ratio increased in various widths with the line defect attendance. The overall increase in terms of transconductance and
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Published 23 Oct 2015

Charge carrier mobility and electronic properties of Al(Op)3: impact of excimer formation

  • Andrea Magri,
  • Pascal Friederich,
  • Bernhard Schäfer,
  • Valeria Fattori,
  • Xiangnan Sun,
  • Timo Strunk,
  • Velimir Meded,
  • Luis E. Hueso,
  • Wolfgang Wenzel and
  • Mario Ruben

Beilstein J. Nanotechnol. 2015, 6, 1107–1115, doi:10.3762/bjnano.6.112

Graphical Abstract
  • relative to the TFT device with a channel length of 100 μm is shown. The curve clearly outlines a p-type transistor behavior of the device [33][34][35], and the on/off current ratio calculated from this curve is greater than 104. As a result of the electrical characterization of four Al(Op)3-based TFT
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Published 05 May 2015

Microwave assisted synthesis and characterisation of a zinc oxide/tobacco mosaic virus hybrid material. An active hybrid semiconductor in a field-effect transistor device

  • Shawn Sanctis,
  • Rudolf C. Hoffmann,
  • Sabine Eiben and
  • Jörg J. Schneider

Beilstein J. Nanotechnol. 2015, 6, 785–791, doi:10.3762/bjnano.6.81

Graphical Abstract
  • deposition cycles, obtained at drain–source voltage of 30 V, for gate–source voltage varied from 0–30 V in 10 V steps. Characteristic values for field-effect mobility μ, threshold voltage (Vth), and on/off current ratio (Ion/off) of wt TMV/ZnO hybrid material based transistor devices. Supporting Information
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Published 20 Mar 2015

Numerical investigation of the effect of substrate surface roughness on the performance of zigzag graphene nanoribbon field effect transistors symmetrically doped with BN

  • Majid Sanaeepur,
  • Arash Yazdanpanah Goharrizi and
  • Mohammad Javad Sharifi

Beilstein J. Nanotechnol. 2014, 5, 1569–1574, doi:10.3762/bjnano.5.168

Graphical Abstract
  • graphene nanoribbon that is symmetrically doped with boron nitride (BN) as a channel material, is numerically studied for the first time. The device merit for digital applications is investigated in terms of the on-, the off- and the on/off-current ratio. Due to the strong effect of the substrate roughness
  • Green's function (NEGF) formalisms. The results show that with an appropriate selection of the substrate material, the proposed devices can meet the on/off-current ratio required for future digital electronics. Keywords: boron nitride; non-equilibrium Greens function (NEGF); on-/off-current ratio
  • the on/off-current ratio for a 10 nm long 4h-2BN-ZGNRFET on a SiO2 substrate does not meet the required amount of 104 for digital transistors [5]. It is possible however to improve the device performance in terms of on/off-current ratio by increasing the width of the BN-doped regions. Figure 5a shows
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Published 17 Sep 2014

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

  • Pia Sundberg and
  • Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

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Published 22 Jul 2014
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